Use of Scalable Parametric Measurement Macro to Improve Semiconductor Technology Characterization and Product Test

Jeanne Bickford,  Nazmul Habib,  John Goss,  Robert McMahon,  Rajiv Joshi,  Rouwaida Kanj
IBM


Abstract

Use of a Scaling Parametric Macro (SPM) provides more accurate threshold voltage information than scribe line structures. This paper compares drive current (Ion) data obtained with the SPM macros to scribe line structure Ion measurements. SPM macros provide less variation than scribe line structures. Since SPM is small enough to be included in all products, the SPM macro provides improved Ion product screening.